原子沉积设备温度控制方法研究及实现

Research and Realization of Temperature Control Method for Atomic Deposition Equipment

中文关键词: 原子层沉积  ADRC  PLC  温度控制

英文关键词: s Collection. Hefei, 2017:34.

中文摘要:

      目的 为提高原子层沉积镀膜腔温度控制的快速性和稳定性，提高镀膜质量。方法 利用自抗扰控制(ADRC)算法，对各部分参数进行整定，结合组态软件和西门子S7-200 Smart PLC设计一种基于自抗扰的温度控制器。结果 利用自抗扰温度控制器达到了原子沉积镀膜温度控制在具有较小超调的前提下快速、稳定控制的要求，实现了原子层沉积镀膜腔温度的高精度控制，提高了镀膜的质量。结论 经仿真和实际应用证明，对温度控制这种具有较大惯性的控制系统，本文所设计的ADRC温度控制器的快速性和准确性均优于传统的PID控制器，且具有明显的抗干扰能力。

英文摘要:

      The work aims to improve the temperature control rapidity and stability of the atomic layer deposition coating chamber and to improve the coating quality. A temperature controller was designed by utilizing the active disturbance rejection control (ADRC) algorithm, rectifying the parameters of each part, and combining the configuration software and Siemens S7-200 Smart PLC. The active disturbance rejection temperature controller was used to achieve the requirement of fast and stable control of atomic deposition coating temperature under the premise of having small overshoot, realizing high-precision temperature control of the atomic layer deposition coating cavity and improving the quality of the coating. The simulation and practical application show that, for a temperature control system with high inertia, the ADRC temperature controller designed in this paper is faster and more accurate than the traditional PID controller, and has obvious disturbance rejection ability.